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Wet etch & cleans

INCREASE YIELD. LOWER COSTS.

Wet Etch Clean Filters – Improving Media and Substrate Cleanliness

Advanced Wet Etch Clean Filters provide improved bath cleanliness, by providing sub-micron filtration at very low pressure drops, thereby achieving high levels of particle retention without sacrificing flow rate. They are customizable and work to prevent particulate from reaching the hard disk’s surface. Wet Etch Clean filters aggressively eliminate particulate in chemical and D.I. Water baths that can cause defects in hard disk media.

 

Applications:

  • Recirculating baths
  • Single Pass Systems

 

Benefits:

  • Enhanced process stability
  • Extended chemical life
  • Reduction in hard disk defects

 

Our Wet Etch Clean Filters eliminate defects on both glass and aluminum substrates, while maintaining long filter lifetime, thereby reducing your cost per disk. Contact a Pall expert and learn how you can better control your process conditions to improve operating cost, increase yield and lower your cost per disk. 

Contact our team of filtration experts for more information on improving the efficiency of your process.

 

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Let’s connect. We want to share our innovative filtration solutions with you today. Contact our knowledgeable subject matter experts for information on how we can help. Thank you and we look forward to assisting you shortly.

Choose Industry
  • Corporate
  • Aerospace
  • Biotech
  • Chemicals & Polymers
  • Food & Beverage
  • Industrial Manufacturing
  • Laboratory
  • Medical
  • Microelectronics
  • Oil & Gas
  • Power & Utilities
Choose Support Type
  • General Inquiry
  • Pricing / Quotation
  • Technical Help
Would you like to receive more information about Pall’s products and services, and related products and services from Pall’s related companies?

By clicking the Submit button below and proceeding I confirm that I have reviewed and agree with the Terms of Use and the Privacy Policy.

Thank You

We will get in touch with you very shortly.