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Cleaning

Our wet etch clean systems provide cleanliness solutions for sterilization systems including recirculating chemical baths, high pressure jet sprays, and mechanical scrubbing systems.

Remove unwanted particles

Advanced Display Cleaning Systems Offer High Flow and Industry Leading Particle Removal

Wet Etch Cleans

Our wet etch clean systems provide cleanliness solutions for sterilization systems including recirculating chemical baths, high pressure jet sprays, and mechanical scrubbing systems. These customizable filters work to prevent defects from reaching the display’s inner surfaces. Wet etch clean filters aggressively eliminate the impurities in chemical baths that degrade display functionality. Cutting-edge products in the 30-100 nm range are available to meet all microelectronic display applications, in a variety of wet etch cleaning processes.

 

Post Polishing Cleans

We offer a range of media and configurations for both bulk and POU applications to enable substrate producers to meet ultra-smooth wafer requirements. Advanced filters allow for enhanced cleanliness in post cleans steps by removing unwanted particle contaminants. They can be customized for different working pressures and chemistries. The UPK design incorporates all fluoropolymer components for a variety of chemical compatibilities.

 

Our post polishing filtering systems improve process stability and eliminate the fouling of downstream equipment for reduced downtime, increased maintenance savings, and higher process yields.

 

Photolithography Process Cleans

Our photolithography filter systems use diverse membrane materials to effectively eliminate contaminants in photolithography process chemicals. Bulk filters and point-of-use (POU) dispense filters prevent the deposition of unwanted particles and reduce defects on the display substrate. In addition to particle and gel removal, POU filters minimize microbubble formation, reduce chemical consumption, and offer exceptional compatibility.

 

Our optimized filter designs offer unmatched particle removal efficiency at high flow rates and for the aggressive chemicals needed to create high resolution large substrate sizes. The ECTFE medium is engineered to remove gel/soft particles and to extend chemical life.

 

Benefits

  • Enhanced process stability
  • Increased area/process efficiency
  • Extended chemical life
  • Reduction in display defects

 

Our Display Clean Systems eradicate defect-causing contaminants from crucial cleaning systems. For more information, contact a Pall expert today.

Contact our team of filtration experts for more information on improving the efficiency of your process.

 

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Let’s connect. We want to share our innovative filtration solutions with you today. Contact our knowledgeable subject matter experts for information on how we can help. Thank you and we look forward to assisting you shortly.

Choose Industry
  • Corporate
  • Aerospace
  • Biotech
  • Chemicals & Polymers
  • Food & Beverage
  • Industrial Manufacturing
  • Laboratory
  • Medical
  • Microelectronics
  • Oil & Gas
  • Power & Utilities
Choose Support Type
  • General Inquiry
  • Pricing / Quotation
  • Technical Help
Would you like to receive more information about Pall’s products and services, and related products and services from Pall’s related companies?

By clicking the Submit button below and proceeding I confirm that I have reviewed and agree with the Terms of Use and the Privacy Policy.

Thank You

We will get in touch with you very shortly.