2020-11-10T01:00:00.000
More Microelectronics Events
Join us at a location near you to meet our experts and product specialists, and learn out how the latest technical innovations can improve both the efficiency and quality of your processes at all scales.
March 2020
Semicon China 2020

Shanghai New International Expo Centre (SNIEC), Shanghai

SEMICON China - The World's Largest Semiconductor Industry Platform, where Market, Technology, Investmet Opportunirites come together !.

The main focus of SEMICON China is the further development of the China semiconductor and related emerging industries. High level executives from the industry, science and government will present their view and showcase their latest products and technology in the premier stage.

 

Pall Filter (Beijing) Co.,Ltd is a separate subsidiary of Pall Corporation. We provide thousands products manufactured throught Pall grobal filter factories, which widely used in Microelectronics and many other industries. Bejing factory can manufacture all kinds of filter housing and fluid separation system for Asian and Australia countries. Pall Scientific Laboratory and Services (SLS) is a customer service department which providing expert technical and scientific assistance to solve complex filter application and contamination control problems. 

 

Pall supports the solar energy, semiconductor, display, ink jet and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, CMP and lithography processes.

February 2020
SPIE Advanced lithography 2020

San Jose Convention Center, San Jose, California, United States

Come to the world's premier lithography event.
For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

 

Pall is introducing the latest retention and cleanliness improvements for our lithgraphy filters.

Pall offers a complete line of filtration, purification and separation technologies for all lithography processes. These include advanced Nylon 6,6. High density polyethylene and PTFE media. Pall has demonstrated that our inovative filter technologies can significantly reduce defectivity, decrease filter start uptime and improve overall cost of ownership. Find out how Pall can help you improve your lithography process.