More Microelectronics Events
Join us at a location near you to meet our experts and product specialists, and learn out how the latest technical innovations can improve both the efficiency and quality of your processes at all scales.
December 2018
Semicon Japan 2018

Microelectronics | Pall Corporation, Tokyo Big Sight, Tokyo

Premier Exposition for the Electronics Manufacturing Supply Chain

November 2018
INPRINT 2018

Microelectronics | Pall Corporation, MiCo Milan, Milan

Exhibition for Industrial Print Technology

SEMICON Europa 2018

Microelectronics | Pall Corporation, Messe München, Munich

The largest Microelectronics Event in Europe, co-located with electronica 2018

October 2018
The Inkjet Conference 2018

Microelectronics | Pall Corporation, Swissôtel Düsseldorf/ Neuss, Düsseldorf, Germany

The world’s largest inkjet conference for inkjet engineering and inkjet chemistry

September 2018
Semicon Taiwan 2018

Microelectronics | Pall Corporation, Taipei Nangang Exhibition Center, Taipei, Taiwan

The Largest Microelectronics Event in Taiwan

 

Taiwan Claimed the Largest Market for New Semiconductor Equipment for the Fifth Year in a Row

Over 700 Exhibitors from the Globe Covering more than 1,700 Booths

Expected to Attract Over  43,000 Visitors and 3,300 Program Participants in 2017

45% of the visitors are above management level and 52% with purchasing power

 

UCPSS 2018

Microelectronics | Pall Corporation, “Hallen” Leuven, Leuven

The SYMPOSIUM ON ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES

 

This symposium is a bi-annual event devoted to cleaning and surface preparation for micro and nano-technology for electronic applications and related fields such as photo-voltaics and bio-electronics.

July 2018
ALD 2018

Microelectronics | Pall Corporation, Songdo Convensia, Yeonsu-Gu, Incheon

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled depositon of thin films and now topics related to atomic layer etching.

Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scienctists.  This year, the ALD conference will again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018) , so that attendees can interact freely.  The conference will take place Sunday July 29 - Wednesday, August 1, 2018, at the Songdo Convensia in Incheon South Korea.

April 2018
IDTechEx Show - Printed Electronics Europe 2018

Microelectronics | Pall Corporation, Estrel Convention Center, Berlin

March 2018
Semicon China 2018

Microelectronics | Pall Corporation, Shanghai New International Expo Centre, Shanghai

SEMICON China connects you to the world's fastest-growing and most dynamic microelectronics market, and gives you the platform to shwcase your products, technologies, and brand in front of the most qualified audience of industry professionals in China.

 

Pall Filter (Beijing) Co.,Ltd is a separate subsidiary of Pall Corporation. We provide thousands products manufactured throught Pall grobal filter factories, which widely used in Microelectronics and many other industries. Bejing factory can manufacture all kinds of filter housing and fluid separation system for Asian and Australia countries. Pall Scientific Laboratory and Services (SLS) is a customer service department which providing expert technical and scientific assistance to solve complex filter application and contamination control problems. 

 

Pall supports the solar energy, semiconductor, display, ink jet and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, CMP and lithography processes.

February 2018
SPIE Advanced lithography 2018

Microelectronics | Pall Corporation, San Jose Convention Center, San Jose, California, United States

Come to the world's premier lithography event.
For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

 

Pall is introducing the latest retention and cleanliness improvements for our lithgraphy filters.

Pall offers a complete line of filtration, purification and separation technologies for all lithography processes. These include advanced Nylon 6,6. High density polyethylene and PTFE media. Pall has demonstrated that our inovative filter technologies can significantly reduce defectivity, decrease filter start uptime and improve overall cost of ownership. Find out how Pall can help you improve your lithography process.