Helping LED Producers Shine

Ensuring longevity of capital equipment and result in desired LED quality.

By implementing our effective filter technologies, process stability can be achieved and necessary process conditions can be sustained leading to the highest yields possible and lowest operating costs. Selection of proper filtration technology is of paramount importance to maximize product quality, improve equipment uptime, as well as keeping manufacturing costs at lowest possible levels. Pall Filtration technologies are ideal for use in LED processes, including ultrapure water filtration and process gas purification/filtration. We offer durable filtration and purification solutions specifically designed to streamline LED process efficiency and improve business performance.

 

Our high performing filters lead to the highest LED quality by protecting critical substrate surfaces from particulate contamination that cause defects and yield issues. Without effective filtering, equipment unplanned downtime (UPDT) is drastically increased along with the frequency of both scheduled and unscheduled maintenance activities. Effective and reliable removal of contaminants also improves the efficiency of downstream LED processes which directly impact the longevity of process equipment and help reduce maintenance downtime.

CMP

Pall CMP Filters maintain slurry chemistry, control particle size, and limit particle density. The advanced filters provide users with effective removal of contaminants that can be tailored to fit any LED manufacturer’s specific process chemistries.
Pall CMP Filters maintain slurry chemistry, control particle size, and limit particle density. The advanced filters provide users with effective removal of contaminants that can be tailored to fit any LED manufacturer’s specific process chemistries.
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Photolithography

Pall Photolithography Filters use a variety of proprietary membrane materials to minimize pressure drop and reduce particulate contamination. Pall’s optimized filter designs, reduce start-up and minimize operator exposure to photoresist chemicals used in the HBLED manufacturing process.
Pall Photolithography Filters use a variety of proprietary membrane materials to minimize pressure drop and reduce particulate contamination. Pall’s optimized filter designs, reduce start-up and minimize operator exposure to photoresist chemicals used in the HBLED manufacturing process.
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Process gas filtration

High-capacity process gas purifiers remove moisture, oxygen, carbon dioxide and other contaminants from process gases such as nitrogen, ammonia, argon, and hydrogen to improve LED manufacturing efficiency and reduce equipment maintenance time and cost.
High-capacity process gas purifiers remove moisture, oxygen, carbon dioxide and other contaminants from process gases such as nitrogen, ammonia, argon, and hydrogen to improve LED manufacturing efficiency and reduce equipment maintenance time and cost.
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Process gas purification

Pall’s Process Gas Purification Systems eliminate and minimize harmful molecular contaminants that cause defects on the LED substrate. Molecular impurities in the process gases such as siloxanes and moisture can lead to process inconsistencies, ultimately leading to destructive level defects and reduced LED quality.
Pall’s Process Gas Purification Systems eliminate and minimize harmful molecular contaminants that cause defects on the LED substrate. Molecular impurities in the process gases such as siloxanes and moisture can lead to process inconsistencies, ultimately leading to destructive level defects and reduced LED quality.
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Trace moisture detection

Moisture contamination is hazardous to the LED manufacturing process. Manufactures must rely on robust detection systems to detect trace moisture contaminant levels in high purity electronics grade gases.
Moisture contamination is hazardous to the LED manufacturing process. Manufactures must rely on robust detection systems to detect trace moisture contaminant levels in high purity electronics grade gases.
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Ultrapure Water

Pall Ultrapure Water Filtration products reliably remove colloidal contaminants such as silica and bacterial breakdown products. Pall UPW Filters efficiently remove contaminants at certain parts of the UPW system to reduce surface LED defects seen from bacteria and particulate contaminants.
Pall Ultrapure Water Filtration products reliably remove colloidal contaminants such as silica and bacterial breakdown products. Pall UPW Filters efficiently remove contaminants at certain parts of the UPW system to reduce surface LED defects seen from bacteria and particulate contaminants.
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Wet etch and cleans

Ultipleat® SP DR Filters offer exceptional retention, flow rates and pressure drops as lower-cost alternatives to all-perfluoropolymeric filters.
Ultipleat® SP DR Filters offer exceptional retention, flow rates and pressure drops as lower-cost alternatives to all-perfluoropolymeric filters.
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Lowering expenses. increasing value.

Advanced filtration solutions maximize LED yields, reduce substrate defects, extend chemical life, and reduce equipment UPDT through economical and reliable filtration performance.

Manufacturing costs are of utmost concern as consumers want access to cheaper and cheaper lightning solutions. In order for these low prices to be achievable and compete with other light systems, effective filtering is necessary to extend chemical usage, reduce defects, and prolong equipment life. We have the filtration technology, manufacturing experience and process knowledge to help improve any chemical process.

 

We have designed specific filtration technologies for almost all process steps in the LED process from crystalline ingot growth, shaping and wafering to thin film processing and Ultra-Pure Water Filtration. Large scale LED manufacturing operations are pushing manufacturing precision requirements to higher and higher levels and creating better substrates for more efficient LEDs. LED processes are extremely sensitive to the presence of contaminants. Impurities such as water and particulates directly impact each step of the process resulting in increased frequency of unscheduled maintenance operations, costly downtime and significant reduction in LED product quality.

 

Removing molecular level particles from process gas streams is critical to ensure longevity of capital equipment and result in desired LED quality. Pall’s passion for purity and protection is undeniable with industry proven applications and results. To effectively create the substrates required for the new efficient LED systems, critical steps need to be free from contamination or defects will propagate. Substrate cleaning and preparation are crucial in order to successfully remove contaminants that have entered the surface.

 

We have the filter solutions for ultrapure water filtration and process gas filtration/purification. Whether for the initial crystalline ingot growth process or the final thin film coating process, Pall Filtration has filtration options that remove contaminants to the levels LED manufacturers highly desire. 

 

Pall LED Filtration technologies maximize manufacturing process performance by eliminating contaminants in critical process gas streams to reduce defects. Click here to let a Pall expert show you how to optimize your LED processes to maximize your sites product quality, extend equipment life and performance, and reduce operating costs.

Pall’s passion for purity and protection is undeniable with industry proven applications and results.