Higher flow rates. longer service life.

Meeting and exceeding industry standards

Our high-tech solutions have a broad range of applications for the semiconductor industry, including process gas filtration, trace moisture detection, ultrapure water, and wet etch and cleans. The chemical filtration and purification products that we develop and manufactures are the result of decades of experience serving the semiconductor and related industries.

 

We partner with suppliers and end users to provide chemical mechanical polishing (CMP) filtration solutions, and is continually working to develop more efficient and economic products that address the wide variety of slurries and applications. Semiconductor manufacturers choose Pall filtration and purification products for their process-enabling features, quality, cost reduction and productivity improvements.

 

Particle Removal Efficiency Evaluation of Filters in IPA

Particle size removed by filter for IPA is required to be smaller in accordance with the control level of the contaminant.

Chemicals

Contamination control is one of the most critical concerns in the manufacture of semiconductor devices. Pall Corporation provides filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
Contamination control is one of the most critical concerns in the manufacture of semiconductor devices. Pall Corporation provides filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
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CMP

Pall’s CMP filters effectively remove large slurry particles and maintain desired slurry formulation and chemistry. With the option of tailoring to ILD, STI, Tungsten, Bulk Copper, Barrier Copper, and other slurries, implementing Pall filters leads to a reduction in micro-scratches, arc scratches, chatter marks and process instability.
Pall’s CMP filters effectively remove large slurry particles and maintain desired slurry formulation and chemistry. With the option of tailoring to ILD, STI, Tungsten, Bulk Copper, Barrier Copper, and other slurries, implementing Pall filters leads to a reduction in micro-scratches, arc scratches, chatter marks and process instability.
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Photolithography

Pall photolithography filters use a variety of proprietary membrane materials to minimize particles, metallic contributions, gels, and microbubbles. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface for increased yields.
Pall photolithography filters use a variety of proprietary membrane materials to minimize particles, metallic contributions, gels, and microbubbles. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface for increased yields.
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Process gas filtration

Pall’s process gas filters provide effective removal of particles through superior filtration technology. Benefits include high particle removal efficiency, high flow rates with / low differential pressure, and low outgassing. In addition, our all-metal filters are highly transparent to molecular contamination.
Pall’s process gas filters provide effective removal of particles through superior filtration technology. Benefits include high particle removal efficiency, high flow rates with / low differential pressure, and low outgassing. In addition, our all-metal filters are highly transparent to molecular contamination.
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Process gas purification

A method to eliminate and minimize harmful molecular contaminants is essential in areas where traditional particle filtration is ineffective. Pall’s high capacity purification systems provide highly efficiency molecular impurity removal with a long service life, translating to low cost of ownership.
A method to eliminate and minimize harmful molecular contaminants is essential in areas where traditional particle filtration is ineffective. Pall’s high capacity purification systems provide highly efficiency molecular impurity removal with a long service life, translating to low cost of ownership.
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Trace moisture detection

Pall Trace Moisture Detection systems provide early warnings of purifier end-of-life and the identification of unwanted moisture contamination in process gas lines. They are ideal for certifying and qualifying ultrahigh purity argon, nitrogen and clean dry air (CDA) in a compact mobile platform.
Pall Trace Moisture Detection systems provide early warnings of purifier end-of-life and the identification of unwanted moisture contamination in process gas lines. They are ideal for certifying and qualifying ultrahigh purity argon, nitrogen and clean dry air (CDA) in a compact mobile platform.
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Ultrapure water

Pall Ultrapure Water Filtration products remove colloidal contaminants such as silica, bacterial breakdown products.. The filters and purifiers efficiently eliminate contaminants at parts of the UPW system to mitigate the harmful effects of metal ionic and particulate contamination.
Pall Ultrapure Water Filtration products remove colloidal contaminants such as silica, bacterial breakdown products.. The filters and purifiers efficiently eliminate contaminants at parts of the UPW system to mitigate the harmful effects of metal ionic and particulate contamination.
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Wet etch and cleans

Ultipleat® SP DR Filters provide advanced 2 nanometer retention in critical surface preparation chemical baths such as HF and BOE. The patented asymmetric pore design, developed using Pall’s proprietary membrane modeling technology, reduces flow resistance and provides longer service life.
Ultipleat® SP DR Filters provide advanced 2 nanometer retention in critical surface preparation chemical baths such as HF and BOE. The patented asymmetric pore design, developed using Pall’s proprietary membrane modeling technology, reduces flow resistance and provides longer service life.
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Higher flow rates. Longer service life.

Advanced filtration and separation solutions for semiconductor manufacturing deliver optimal results and cost-savings while offering advanced nanometer retention.

A method to eliminate and minimize harmful molecular contaminants is essential in semiconductor manufacture, where traditional particle filtration is ofen ineffective. Pall’s high capacity purification systems provide molecular impurity removal with a long service life. Pall filters score high on particle retention, permeability, purity, and robustness. Applications in the semiconductor industry include integrated circuits, data storage, flat panel displays and photovoltaics.

 

We comply with the EPA 2010/15 PFOA Stewardship program and completely removed the use of PFOA (perfluorooctanoic acid) as a processing aid in the production of fluoropolymer materials. This program has been adopted globally by the largest fluoropolymer manufacturers and their end customers. The term “PFOA Free” indicates filter materials are not formulated using PFOA as a trace constituent. All fluoropolymer filter components for wet etch and clean applications have been qualified with PFOA free material.

 

Isopropyl alcohol (IPA) is a chemical commonly used for the wafer drying process in the semiconductor industry. The control level of contaminant in IPA is getting more stringent, as the feature size of the semiconductor devices decreases. Filtration plays an important role in reducing the contaminant, and we are  committed to offering the most advanced technology on the market to meet this need. Particle size removed by filter for IPA is required to be smaller in accordance with the control level of the contaminant. Another important requirement of filters used in IPA is to minimize extractables from the filters themselves. Polytetrafluoroethylene (PTFE) membrane filters are being used in more cases, in place of high-density polyethylene (HDPE) membrane filters.

 

Our purification and filtration technology for semiconductor applications offer advanced nanometer retention. For more information, click here to see purchase information or talk to a Pall expert.

Pall filters score high on particle retention, permeability, purity, and robustness.