Contamination control is one of the most critical concerns in the manufacture of semiconductor devices. Pall Corporation provides filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
Pall Products and Technologies provide new, improved and timely filtration capabilities in the semiconductor market for a range of applications. The chemical filtration and purification products that Pall develops and manufactures are the result of decades of experience serving the semiconductor and related industries. Each filter type from a wide selection of materials rates highly on product characteristics and adheres to strict quality control programs.
Pall offers innovative purification and filtration technologies for new and expanding markets, leading the way with consistent, reliable performance for state-of-the-art cleaning methods and manufacturing processes. Applications in the semiconductor industry include integrated circuits, data storage, flat panel displays, and photovoltaics. Pall filters score high on particle retention, permeability, purity, and robustness. Specifically, they achieve sub-ppb total metal on extractables, low pressure drop, and retention to 5 nm with PTFE.
With demonstrated technical leadership in material science, Pall has produced filters constructed of PTFE, polyarylsulfone, nylon, PVDF, polyethylene, and polysulfone, providing the best selection for each application. A new highly asymmetric polyarylsulfone membrane improves filtration while lowering operational costs. Pall electronics-grade high-purity chemical filters meet stringent quality control programs.
Pall Products and Technologies improve critical chemical processes in the semiconductor industry.
The leader in purification and filtration technology
Pall Products and Technologies – Contaminant Control in Expanding Semiconductor Industry
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Providing filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.5>
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